• Instructor: Prof. David T. Attwood Email: attwood@berkeley.edu
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• Co-listed at UC Berkeley as EE213 and AST210
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• Spring semester, January 19 to May 7, 2009, Tu & Th 2:10--3:30 PM
• 2009 Class Schedule
  
  
• Old lectures at www.coe.berkeley.edu/AST/sxreuv and www.coe.berkeley.edu/AST/srms and www.youtube.com
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• Paperback textbook:

Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications Cambridge University Press or or ASUC bookstore Table of contents Errata

• Lecture material used in class:



1. Class Overview 2009
2. X-Ray Interaction with Matter
3. Maxwell's Equations; Refractive Index
4. Reflection and Refraction
5. Multilayer Interference Coatings
6. Radiated Power and Scattering
7. Overview of EUV Lithography
8. EUV Lithography (Dr. Patrick Naulleau, CXRO/LBNL)
9. Introduction to Synchrotron Radiation, Bending Magnet Radiation
10. Undulator Radiation, Radiated Power
11. Beam Parameters, Spectral Brightness, Wiggler
12. Spatial and Temporal Coherence; Coherent Undulator Radiation
13. Imaging with Coherent X-Rays (Dr. Anne Sakdinawat, CXRO/LBNL)
14. High Harmonic Generation
15. High Harmonic Generation II (Dr. Yanwei Liu, CXRO/LBNL)
16. Introduction to Plasmas
17. Waves in Plasmas and Emission Spectra
18. Plasma Sources for EUV Lithography
19. EUV and Soft X-Ray Lasers
20. Wavelength Scaling and Seeded EUV Laser
21. Zone Plate Microscopy and Applications

• Homework problems (Solutions available upon request)



Chapter 1	Chapter 6
Chapter 2	Chapter 7
Chapter 3	Chapter 8
Chapter 4	Chapter 9
Chapter 5	Chapter 10

Comments, suggestions, and corrections? Please contact us at sxreuv@coe.berkeley.edu.