Ava Jiang Tan


Selected Publications

  1. Ava J. Tan, Ajay K. Yadav, Korok Chatterjee, Daewoong Kwon, Sangwan Kim, Chenming Hu, Sayeef Salahuddin. A Nitrided Interfacial Oxide for Interface State Improvement in Hafnium Zirconium Oxide-Based Ferroelectric Transistor Technology. To appear in IEEE Electron Device Letters.
  2. Ava J. Tan, Justin C. Wong, Ajay K. Yadav, Korok Chatterjee, Daewoong Kwon, Sangwan Kim, Golnaz Karbasian, Sayeef Salahuddin. Characterization of the Interface States of Ferroelectric Hafnium Zirconium Oxide. SRC (Semiconductor Research Corporation) TECHCON 2017. Best in Session Award.
  3. Daewoong Kwon, Korok Chatterjee, Ava J. Tan, Ajay K. Yadav, Hong Zhou, Angada B. Sachid, Chenming Hu, Sayeef Salahuddin. Improved Subthreshold Swing and Short Channel Effect in FDSOI n-Channel Transistors. Submission in progress.
  4. Korok Chatterjee, Sangwan Kim, Golnaz Karbasian, Ava J. Tan, Ajay K. Yadav, Asif I. Khan, Chenming Hu, Sayeef Salahuddin. Self-aligned, Gate Last, FDSOI, Ferroelectric gate Memory Device with 5.5 nm Hf0.8Zr0.2O2, High Endurance and Breakdown Recovery. IEEE Electron Device Letters, 38(10), 1379-1382 (2017).
  5. Golnaz Karbasian, Roberto dos Reis, Ajay K. Yadav, Ava J. Tan, Chenming Hu, Sayeef Salahuddin. Stabilization of Ferroelectric Phase in Tungsten Capped Hf0.8Zr0.2O2. Appl. Phys. Lett. 111(2), 022907 (2017).
  6. Golnaz Karbasian, Ava Tan, Ajay K. Yadav, Eric M. H. Sorensen, Claudy R. Serrao, Asif I. Khan, Korok Chatterjee, Sangwan Kim, Chenming Hu, Sayeef Salahuddin. Ferroelectricity in HfO2 thin films as a function of Zr doping. 2017 International Symposia on VLSI Technology, Systems and Applications (VLSI-TSA 2017).
  7. Ava Tan, Udit Gupta, Christine Hwang. MediBot: Your Personal Medicine Botler, Circuit Cellar Magazine #317, pp 14-21. December 2016.

Selected Presentations/Talks

  1. Ava J. Tan. Interface Engineering of Ferroelectric Hafnium Zirconium Oxide on Silicon, in 2017 UCLA CHIPS (Center for Heterogeneous Integration and Performance Scaling) Workshop, Los Angeles, CA, USA. November 1, 2017.
  2. Ava J. Tan. A Nitrided Interfacial Oxide for Interface State Improvement in Ferroelectric Transistor Technology, in 2017 Lam Research Technical Symposium, Fremont, CA, USA. October 2, 2017. Best Poster Award.
  3. Ava J. Tan. Characterization of the Interface States of Ferroelectric Hafnium Zirconium Oxide, in SRC (Semiconductor Research Corporation) TECHCON 2017, Austin, TX, USA. September 11, 2017. Best in Session Award.
  4. Ava Tan. Ferroelectricity in HfO2 thin films as a function of Zr doping, in 2017 International Symposia on VLSI Technology, Systems and Applications (VLSI-TSA 2017), Hsinchu, Taiwan. April 25, 2017.
  5. Ava Tan. Spray Pyrolyzed Lanthanum-doped Zirconia for Thin Film Transistor Applications. Center for E3S (Energy Efficient Electronics Science), Berkeley, CA, USA. August 6, 2015.

Teaching Experience